Repetitive Plasma Focus
A
Powerful Soft X-ray Source for X-ray Lithography Based on Plasma Focusing
E. P. Bogolyubov, V. D. Bochkov, V. A. Veretennikov,1 L. T.
Vekhoreva, V. A. Gribkov, A. V. Dubrovskii, Yu. P. Ivanov, A. I. Isakov, O. N.
Krokhin, P. Lee, S. Lee, V. Ya. Nikulin, A. Serban, P. V. Silin, X. Feng and G.
X. Zhang
Physica Scripta. Vol. 57, 488È494, 1998
Soft x-ray yield from NX2 plasma focus
S. Lee, R. S. Rawat, P. Lee and
S. H. Saw J. Appl. Phys. 106,
023309 (2009) (6 pages) Online
Publication Date: 30 July 2009
HIGH REPETITION HIGH
PERFORMANCE PLASMA FOCUS AS A POWERFUL RADIATION SOURCE
S. Lee, P. Lee, G. X. Zhang, V. A.Gribkov, X. Feng, M. H.
Liu and A.Serban Presented at
High Energy
Photon Lithography for Fabrication of Photonic Device.
S. Lee, V.Kudryashov , P. Lee, M Liu and T.L.Tan ISPA 1999
Dense Plasma
Focus radiation source for microlithography & micro-machining
Vladimir A. Gribkov, Liu Mahe, Paul Lee, Sing Lee, Ashutosh Srivastava In Microlithographic Techniques in Integrated Circuit Fabrication II, Chns A. Mack, Xiaocong Yuan, Editors, Proceedings of SPIE Vol. 4226 (2000)
High
Rep Rate High Performance Plasma Focus as a Powerful Radiation Source
Sing Lee, Paul Lee, Guixin Zhang, Xianping Feng, Vladimir A.
Gribkov, Mahe Liu, Adrian Serban, Member, IEEE, and Terence K. S. Wong, Member,
IEEE
IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 26, NO. 4, AUGUST
1998 1119