Repetitive Plasma Focus

 

A Powerful Soft X-ray Source for X-ray Lithography Based on Plasma Focusing

E. P. Bogolyubov, V. D. Bochkov, V. A. Veretennikov,1 L. T. Vekhoreva, V. A. Gribkov, A. V. Dubrovskii, Yu. P. Ivanov, A. I. Isakov, O. N. Krokhin, P. Lee, S. Lee, V. Ya. Nikulin, A. Serban, P. V. Silin, X. Feng and G. X. Zhang

Physica Scripta. Vol. 57, 488494, 1998

 

Soft x-ray yield from NX2 plasma focus

S. Lee, R. S. Rawat, P. Lee and S. H. Saw J. Appl. Phys. 106, 023309 (2009) (6 pages) Online Publication Date: 30 July 2009  

 

HIGH REPETITION HIGH PERFORMANCE PLASMA FOCUS AS A POWERFUL RADIATION SOURCE

S. Lee, P. Lee, G. X. Zhang, V. A.Gribkov, X. Feng, M. H. Liu and A.Serban Presented at Opole Jarnoltowek Poland 1997

 

High Energy Photon Lithography for Fabrication of Photonic Device.

S. Lee, V.Kudryashov , P. Lee, M Liu and T.L.Tan ISPA 1999 Singapore

 

Dense Plasma Focus radiation source for microlithography & micro-machining

Vladimir A. Gribkov, Liu Mahe, Paul Lee, Sing Lee, Ashutosh Srivastava In Microlithographic Techniques in Integrated Circuit Fabrication II, Chns A. Mack, Xiaocong Yuan, Editors, Proceedings of SPIE Vol. 4226 (2000)

 

High Rep Rate High Performance Plasma Focus as a Powerful Radiation Source

Sing Lee, Paul Lee, Guixin Zhang, Xianping Feng, Vladimir A. Gribkov, Mahe Liu, Adrian Serban, Member, IEEE, and Terence K. S. Wong, Member, IEEE

IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 26, NO. 4, AUGUST 1998 1119